Pattern density multiplication by direct self assembly of block copolymers: Towards 300mm CMOS requirements Journal article
Tiron Raluca, Chevalier Xavier, Gaugiran Stéphanie, Pradelles J., Fontaine H., Couderc C., Pain L., Navarro Christophe, Chevolleau T., Cunge Gilles, Delalande M., Fleury Guillaume, Hadziioannou Georges
Journal title: Proceedings of SPIE, the International Society for Optical Engineering, Volume(s): 8323, Page(s): 83230O 10.1117/12.916400 (2012)