Chemically Amplified Photoresists for 193-Nm Photolithography: Effect of Molecular Structure and Photonic Parameters on Photopatterning Journal article
Ridaoui Hassan, Dirani Ali, Soppera Olivier, Ismailova Esma, Brochon Cyril, Schlatter Guy, Hadziioannou Georges, Tiron Raluca, Bandelier Philippe, Sourd Claire
Journal title: Journal of Polymer Science Part A: Polymer Chemistry, Volume(s): 48, Issue(s): 6, Page(s): 1271-1277 https://hal.science/hal-00679919/document 10.1002/pola.23866 (2010)